Optimization of a PVA/acrylamide material for the recording of multiple diffraction gratings

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Title: Optimization of a PVA/acrylamide material for the recording of multiple diffraction gratings
Authors: Ortuño, Manuel | Gallego, Sergi | Neipp, Cristian | Márquez, Andrés | Beléndez, Augusto | Pascual, Inmaculada
Research Group/s: Holografía y Procesado Óptico
Center, Department or Service: Universidad de Alicante. Departamento de Física, Ingeniería de Sistemas y Teoría de la Señal | Universidad de Alicante. Departamento de Óptica, Farmacología y Anatomía
Keywords: Holography | Holographic recording materials | Photopolymers | Volume holograms | Multiplex holography
Knowledge Area: Óptica | Física Aplicada
Date Created: 2004
Issue Date: 1-Sep-2004
Publisher: SPIE, The International Society for Optical Engineering
Citation: ORTUÑO SÁNCHEZ, Manuel, et al. "Optimization of a PVA/acrylamide material for the recording of multiple diffraction gratings". En: Photon management : 27-28 April 2004, Strasbourg, France / Frank Wyrowski, chair-editor. Bellingham, Wash. : SPIE, 2004. (Proceedings of SPIE; Vol. 5456). ISBN 978-0-81945-383-9, pp. 256-263
Abstract: Photopolymers are considered one of the most interesting materials for holographic storage applications. The search for optimum chemical formulations to improve the quality of the final polymer materials has yielded a great deal of experimental work. different theoretical models have also been developed by different authors to clarify the mechanism of hologram formation inside photopolymer materials. These advances in both experimental and theoretical fields permit obtaining suitable compositions of photopolymer materials for data storage purposes. In this work we present the results of an optimization of a PVA/acrylamide recording material with a high thickness (over 1 mm) to obtain holographic memories. Diffraction gratings of 1125 lines/mm were recorded in this material by using the peristrophic multiplexing technique and using the light from an Argon laser at a wavelength of 514 nm.
Sponsor: This work was supported by the "Ministerio de Ciencia y Tecnología", CICYT, Spain (project MAT2000-1361-C04-04) and by "Generalitat Valenciana", Spain (project GV01-130).
URI: http://hdl.handle.net/10045/9530
ISBN: 978-0-81945-383-9
ISSN: 0277-786X
DOI: 10.1117/12.545841
Language: eng
Type: info:eu-repo/semantics/article
Rights: Copyright 2004 Society of Photo-Optical Instrumentation Engineers. This paper was published in Proceedings of SPIE, vol. 5456, and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Peer Review: si
Publisher version: http://dx.doi.org/10.1117/12.545841
Appears in Collections:INV - GHPO - Artículos de Revistas

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