Sub-400 nm film thickness determination from transmission spectra in organic distributed feedback lasers fabrication

Abstract

The design and fabrication of thin-film based organic optoelectronic devices require knowledge of the film optical properties. A low-cost and non-destructive method often used for optical characterization of films is the well-established spectrophotometric envelope method. However, this method is typically limited to thickness above 400 nm, a value often higher than that of the films involved in these devices. This paper studies a procedure to obtain the thickness of sub-400 nm active films from their spectrophotometric trace when the refractive index is previously known. The proposed procedure is based on comparing the experimental transmission spectrum in the transparent spectral window with that obtained by simulation. The capabilities of the proposed method are demonstrated here by its application in the fabrication of organic distributed feedback lasers, for which a fine control of film thickness is important to obtain an optimized and reproducible response. Results are verified with other techniques, such as ellipsometry and profilometry. Thus, with the proposed method, film thickness can be easily determined down to 40 nm maintaining an accuracy of about 5 nm even for films with low refractive index (1.5–1.7). Different methods to determine refractive index of these films are also discussed.